Spectroscopic imaging ellipsometer (ES) with atomic force microscope (AFM)

<div class="h1">Titel</div> <div class="pre">Spectroscopic imaging ellipsometer (ES) with atomic force microscope (AFM)</div> <div class="h1">Beschreibung</div> <div class="pre">At the Institute of Ion Beam Physics and Materials Research within the department Magnetism at the Helmholtz-Zentrum Dresden-Rossendorf a spectroscopic imaging ellipsometer (ES) integrated with atomic force microscope (AFM) is to be procured. The integration of the ES with AFM is crucial for the further experiments. The system must provide a unique possibility to investigate the optical, magnetic and structural properties of different nanostructured materials including classical semiconductors and 2D materials. In addition, the surface morphology can be determined. The integration of ES with AFM allows easy access to the same investigated field and is especially important for nanowires, 2D materials and other nano-objects. The ES should be equipped with imaging variable angle spectroscopy system with imaging detection system in the spectral range between 190 and 1700 nm. The instrument must give the values as well as microscopic maps and histograms of Delta and Psi with a lateral resolution better than 2 µm. Moreover, the instrument must be able to show ellipsometric contrast live view of the sample with better than 2µm lateral resolution and to measure the ellipsometry angles Delta and Psi at each pixel of the imaged surface area. The instrument must offer the possibility to use in future different light sources, in order to cover the spectral range up to 2700 nm. Moreover, the device must have automatic sample alignment, high precision software controlled goniometer to enable variable angle-of-incident measurements between 40 and 90 deg, angle resolution of 0.001 deg and accuracy of 0.01. The goniometer-head shall be able to align to the surface of a sample in two directions to enable the use on liquids. Since one of the applications includes transparent substrates, the instrument should allow the knife edge illumination that eliminates back side reflections from the substrate. Those back side reflections would lead to wrong results. This is true for Si-substrates as well, when measured at wavelengths above 900 nm, where Si becomes transparent. Also transparent sample of glass-type materials benefit from this. The knife-edge aperture must be adjustable to accommodate different substrate thickness' as well as different refractive index materials. The scope of deliveries and services to be offered includes (i. e. included in the offer price): - delivery at the place of usage according to our contractual and tendering terms and conditions, section 5 "Delivery and acceptance" Place of usage: Room 103 / Building 207 - user documentation in English and German - the footprint, technical drawings, electrical drawings must be supplied in the documentation - minimum 12 month warranty - on-site installation and user training (OST) The fulfilment of the specifications required under 2. Performance quote of annex 01A must be clearly stated in and be part the offer.</div> <div class="h1">Interne Kennung</div> <div class="pre">LOT-0000</div>